Bug 2083933

Summary:	[RGW] Error EINVAL: unrecognized config option 'rgw_keystone_make_new_tenants'
Product:	[Red Hat Storage] Red Hat Ceph Storage	Reporter:	Ronald Monthero <rmonther>
Component:	Documentation	Assignee:	Ranjini M N <rmandyam>
Documentation sub component:	Object Gateway Guide	QA Contact:	Uday kurundwade <ukurundw>
Status:	CLOSED CURRENTRELEASE	Docs Contact:
Severity:	medium
Priority:	unspecified	CC:	rmandyam, vereddy
Version:	5.0
Target Milestone:	---
Target Release:	5.1z2
Hardware:	All
OS:	Linux
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Fixed In Version:		Doc Type:	If docs needed, set a value
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Clone Of:		Environment:
Last Closed:	2022-07-01 04:34:16 UTC	Type:	Bug
Regression:	---	Mount Type:	---
Documentation:	---	CRM:
Verified Versions:		Category:	---
oVirt Team:	---	RHEL 7.3 requirements from Atomic Host:
Cloudforms Team:	---	Target Upstream Version:
Embargoed:

Description Ronald Monthero 2022-05-11 04:00:31 UTC

Describe the issue:

RHCS 5 Object Gateway Guide mentions steps to configure keystone settings in rgw, one such config setting results in 'unrecognized config option'
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[root@dev-ceph-u13 ~]# ceph config set client.rgw rgw_keystone_make_new_tenants true
Error EINVAL: unrecognized config option 'rgw_keystone_make_new_tenants' . 
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Describe the task you were trying to accomplish:

Configuring rgw to use keystone authentication 
Executing Step 2 of Section 5.5.7 of [1] 

# ceph config set client.rgw rgw_keystone_make_new_tenants true

Suggestions for improvement:

- To check the correctness of this bit of content in the RHCS 5 Object Gateway Guide 
- To check if this config setting is required.  
 
Document URL: 
[1] https://access.redhat.com/documentation/en-us/red_hat_ceph_storage/5/html/object_gateway_guide/advanced-configuration#ceph-object-gateway-and-openstack-keystone


Chapter/Section Number and Title: 
Chapter 5:  Section 5.5.7. Configuring the Ceph Object Gateway to use Keystone authentication 


Product Version: RHCS 5.1 

Environment Details:

Any other versions of this document that also needs this update:

Additional information: